Engaged in research on plasma science and engineering since 1982. In particular, we have focused on research on in-situ measurement and control of nanoparticles generated in silane plasma used for fabrication of Si thin film solar cells. Recently, it has been shown that nano-particle control can produce unprecedented high-quality a-Si: H. In 2004 and 2005, he engaged in the research and development of nanocrystalline silicon thin-film cells as a contract research of NEDO. He has received a total of 7 awards, including the 3rd Plasma Electronics Award of the Japan Society of Applied Physics, the 2nd Plasma Electronics Award of the Japan Society of Applied Physics, and the 1st Plasma Material Science Award of the Japan Society for the Promotion of Science.
Engaged in research on generation and growth mechanism of fine particles in plasma at Kyushu University from April 1999. In particular, he was engaged in the development of nanometer-sized particle detection methods. In particular, the following results were obtained. We developed the “cluster-suppressed plasma CVD method” and succeeded in producing an ultra-high quality amorphous silicon thin film at an unprecedented high level. In May 2001, he received the 10th Japan Society of Applied Physics Lecture Encouragement Award, and in 2005 he received the 3rd Plasma Electronics Award of the Japan Society of Applied Physics.
Plasma Physics/ Plasma science/ Formation mechanism and control of nanoparitcles in processing plasmas/ Fabrication of high-quality thin films/ Surface Science/ Green/Energy related materials/ Machine Learning in Plasma Processing
Research interests include plasma processing of solar cells, plasma material interactions, plasma CVD, dusty plasmas, plasma life-sciences and science education. A leading researcher in “plasma fluctuation in reactive plasma”, manifested by three invited talks were given in three workshops on plasma engineering.